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Comparison of areal measurements of the same zone of etched Si and hydroxyapatite layers on etched Si using different profiling techniques

Keywords : Rayonnement
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Conference papers
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https://hal-univ-paris10.archives-ouvertes.fr/hal-01421675
Contributor : Administrateur Hal Nanterre <>
Submitted on : Thursday, December 22, 2016 - 4:27:44 PM
Last modification on : Thursday, March 5, 2020 - 5:38:48 PM

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Mohamed Guellil, Paul C. Montgomery, Pierre Pfeiffer, Bruno Serio. Comparison of areal measurements of the same zone of etched Si and hydroxyapatite layers on etched Si using different profiling techniques. Proceedings of SPIE Optical Micro- and Nanometrology V, Brussels, Belgium, April 14, 2014, Apr 2014, Bruxelles, Germany. pp.913204--913204--9, ⟨10.1117/12.2051476⟩. ⟨hal-01421675⟩

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